Product Name | Silicon Ring |
---|---|
Material | Single Crystal Silicon |
Multi Crystal Silicon |
|
Purity(%) | Single Crystal Silicon ( 8N 99.999999% ) |
Multi Crystal Silicon ( 5N 99.999%) |
|
Applications | Dry etcher process |
Out Dia | 520mm ( max ) |
Thickness (Flatness) | 1~70mm ( <15㎛ ) |
Res. ( Ω.㎝ ) | Low: < 0.02 Middle : 1~5 High 60~90 |
Surface Condition | Polishing |
Lapping |
|
Grinding |
|
Quality ( Visual ) | Chipping |
Scratch |
|
Crack |
|
Stain Free |
|
Quality ( Cleaning Process ) | 원소 당 100ppb 이하 ( Na, Mg, Al, K, Ca, Cr, Fe, Ni, Cu, Zn, Y ) |
최고의 품질상태의 가공능력과 적절한 에칭으로 인해
제품표면에 대한 Damage를 제거합니다.
Product Name | Silicon SHOWER HEAD |
---|---|
Material | Single Crystal Silicon |
순도(%) | Single Crystal Silicon ( 8N 99.999999% ) |
Applications | Dry etcher process |
Out Dia | 440mm ( max ) |
Thickness (Flatness) | 1 ~ 15mm ( <15㎛ ) |
Res. ( Ω.㎝ ) | Low: < 0.02 Middle : 1~5 High 60~90 |
Gas Hole | Diameter 0.3~1.0mm |
Roundness < 0.05mm |
|
Concentricity < 0.05mm |
|
Δ XY-Position < 0.05mm |
|
Surface Condition | Polishing |
Lapping |
|
Grinding |
|
Quality ( Visual ) | Chipping |
Scratch |
|
Crack |
|
Stain Free |
|
Quality ( Cleaning Process ) | 원소 당 100ppb 이하 ( Na, Mg, Al, K, Ca, Cr, Fe, Ni, Cu, Zn, Y ) |
적합한 가공방법으로 홀내부의 품질을 보증합니다.
적합한 가공방법과 적절한 에칭으로 홀내부의 Damage발생을 제거합니다.